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Hitachi SU-70

  The Hitachi SU-70 Analytical Field Emission SEM combines the field proven stability, high current and brightness of the Schottky electron source with the ultra-high resolution required in a multitude of analytical applications. Designed with a semi-in-lens optical configuration, Hitachi's patented ExB technology provides a unique electron signal filtering and mixing system suited for today's demanding applications for research and development and multidiscipline studies. The SU-70 offers an industry-leading technology, quality, and reliability.

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l  Ultra High Resolution Imaging; 1 nm/15 kV, 1.6 nm/1 kV (with Beam Deceleration Mode)*

l  In-lens SE and BSE Signal Filtering and Mixing Mode

l  Sub Nanometer Level Surface Observation at Ultra Low Accelerating Voltages, Provides high resolution, sub nanometer level surface observation at ultra-low accelerating voltages down to 100 V by utilizing the electron beam deceleration function.

l  Maximum Probe Current of 100 nA or Greater Available with the Field Proven Schottky Electron Source. High current and high resolution conditions are optimized for analytical techniques such as EDS*, WDS*, EBSP*, CL*, and e-Beam lithography* for increased productivity and throughput.

l  EBSP Analysis In Field Free (FF) Mode: Hitachi's unique FF mode eliminates the projected magnetic field of the objective lens associated with semi-in-lens technology, and thereby eliminates artifacts during analysis of magnetic samples and with EBSP* applications.

l  Large Analytical Specimen Chamber: Designed to optimize the simultaneous analysis of a wide variety of analytical techniques such as EDS*, WDS*, EBSP*, CL* and e-Beam Lithography* by optimizing the analytical detector solid angle and maintaining high resolution.

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