Hitachi SU9000
The SU9000 is HITACHI's new premium SEM. It features unique electron optics, with the sample positioned inside a gap between the upper and lower parts of the objective lens pole piece. This so-called true in-lens concept - combined with the next generation of HITACHI's cold field emission technology - guarantees the highest possible system resolution (SE resolution 0.4 nm @ 30 kV, 1.2 nm @ 1 kV without requiring beam deceleration technology [0.8nm with beam deceleration]) and stability.
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Features:
- The world's highest SE resolution of 0.4 nm at 30 kV is guaranteed.
- Usable magnification of up to 3,000,000x.
- Newly designed CFE GUN provides high brightness and an extremely stable emission current.
- Superior low kV performance for observing beam sensitive materials.
- Next generation Hitachi In-Lens SEM optics allows for routine observation at 1,000,000x.
- Improved vacuum technology that allows for UHV levels for reduced sample contamination.
- Highly engineered instrument enclosure featuring both superior strength and stability to allow for high resolution imaging in a broad range of environmental conditions.
- Newly designed objective lens enables high resolution imaging at a low acceleration voltage.
- Side entry sample exchange system increases throughput by reducing the time required to change samples and automatically positioning the sample at the current WD.
- The world's highest SE resolution of 0.4 nm at 30 kV is guaranteed.
- Usable magnification of up to 3,000,000x.
- Newly designed CFE GUN provides high brightness and an extremely stable emission current.
- Superior low kV performance for observing beam sensitive materials.
- Next generation Hitachi In-Lens SEM optics allows for routine observation at 1,000,000x.
- Improved vacuum technology that allows for UHV levels for reduced sample contamination.
- Highly engineered instrument enclosure featuring both superior strength and stability to allow for high resolution imaging in a broad range of environmental conditions.
- Newly designed objective lens enables high resolution imaging at a low acceleration voltage.
- Side entry sample exchange system increases throughput by reducing the time required to change samples and automatically positioning the sample at the current WD.